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  Vacuum ultraviolet light source

 Vacuum ultraviolet light source

 

1. Introduction

Resonance Ltd since the 1970s with the Canadian space agency (CSA) professional research and development production of uv light source, and in the 80s - 90s with NASA have close cooperation, now the production of vacuum ultraviolet light source is based on Ar and He, the high-power Xe high flux of three types of ultraviolet light, the wavelength from 117-172 nm. It is widely used in soil composition detection, gas detection, industry and petroleum industry.

 

2. Applications

a.  Industrial pollution control (waste water treatment, waste gas treatment)

b.  Surface modification (polymer photoetching, photoinduced chemical vapor deposition)

c.  Do a spectral test of samples

d.  Transmission test of samples

 

 

3. Specifications

 

 

型号

 

KrLM-L XeLM-L

 

KrLM-LQD XeLM-LQD

 

KrLM-LQD12

XeLM-LQD12

ArCM-L KrCM-L XeCM-L

ArCM-LPu KrCM-LPu XeCM-LPu

ArCM-QDHP KrCM-QDHP XeCM-QDHP

ArCM-LHP KrCM-LHP XeCM-LHP

 

单位

状态

Production

Production

Production

Production

PreProd

PreProd

Development

 

峰值波长 Ar

 

 

 

128

128

128

128

nm

峰值波长 Kr

 

117, 124

 

117, 124

 

117, 124

 

117,124, 145

 

145

 

145

117, 124,

145

 

nm

峰值波长 Xe

147

147

147

147, 172

172

172

147, 172

nm

VUV通量 Ar

na

na

na

5 x 1014

1 x 1015

6 x 1015

2 x 1016

P/sec/str

VUV通量 Kr

3 x 1015

3 x 1015

3 x 1015

5 x 1015

1 x 1016

6 x1016

2 x 1017

P/sec/str

VUV通量 Xe

5 x 1015

5 x 1015

5 x 1015

7 x 1015

1。5 x 1017

1 x 1017

3 x 1017

P/sec/str

全角输出圆锥

45

45

45

45

40

45

45

灯泡窗口位置

-4

+1

10 - 30

-4

-1

3 -20

3

cm

Window CA

0.8

0。8

0.8

0.8

0。8

6 x 0。8

6 x1.8

cm

 

调制和脉冲

 

Mod/option

 

Mod/option

 

Mod/option

 

Mod/option

P

2µsec/1KHz

 

Mod/option

 

CW

 

标准法兰

2.75 CF

2.75CF

2.75CF

2.75CF

2.75CF

4.5CF

4.5CF

英寸

特点

Opt. additional window or lens flange

Rapid lamp interchange, closer to target

Can be close to target deep in vac. chamber

Continuum, good for absorption spectra

Unique VUV pulses Photoionizatio n

 

Higher intensity

 

Higher intensity

 

 

型号

AaBC-DEF where Aa = gas e. g. Kr = Krypton, Xe = Xenon; B = Line or continuum e. g. L = line and C = mixed continuum and line or pure

continuum, C=Window material e. g. M = Magnesium fluoride: -DEF is source configuration e. g. -L = standard lab model, QD = Quick

Disconnect, LPu = lab model pulsed, 12QD = 12 inch re-entrant lamp with Quick disconnect flange, LHP = Lab High

Power

状态

Production = in production, PreProd = pre production prototype tested, Developmental: Still in development

光谱类型

Line: lines at 116。5 and 123.6 nm Krypton, Lines at 129 and 147 Xenon (Argon lines not transmitted by MgF2 window), Mixed: lines at 116.5 and 123。6 nm and Excimer continuum from 123.6 to 170nm which peaks at 145nm, Xenon line at

147 and continuum pk 172

Continuum: Excimer continuum: Ar 110 to 140 nm, Kr 123.6 to 170 nm Xe 145 to 200

窗口位置

Relative to the front the CF flange face. x.y are away from flange and +x。y depth into vacuum chamber from flange face.

 

调制脉冲

Mod/optional: Option to modulate from 1 to 1,000 Hz. P 2μsec/1KHz means that lamp has 2 microsecond pulses driven

by DC pulse supply at

about 1 KHz. Syncing this supply with an external waveform is possible, CW means continuous in time

 

系统

Complete system includes power supply, EMI shielded enclosure, Vacuum flange and NIST traceable test on vacuum monochromator

 


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